Daksh

Seeing and measuring the impossible

VIEW offers a full line of optical metrology systems for wafer, photomask, slider, MEMS, semiconductor package, HDD suspension, probe card, and micro-component process measurements.

Critical Dimensional Measurement Systems

MicroLine 300

The VIEW MicroLine® is a high-performance critical dimensional measurement system designed to measure wafers, masks, MEMS and other micro-fabricated devices in situations which do not require fully automated operation.

MicroLine systems feature the highest quality microscope optics, manually operated stages and programmable light intensity. MicroLine systems are robust and capable of measuring transparent layers, lines with irregular edge and other critical features.

Standard Optional
X,Y,Z Measuring Range (mm) 200x200 300x300
Z Focusing Range (mm) 25
XY Stage Cross roller with manual coaxial positioning and quick release Glass stage insert for use with transmitted light
Imaging Optics Olympus Microscope optics, including horizontal bright field/dark field illuminator, five-objective motorized lens turret, tilt trinocular with eyepieces, and standard camera mounting tube
Front Lens (Field Interchangable) Full spectrum, programmable tungsten halogen coaxial surface light Full spectrum, programmable tungsten halogen transmitted light with adjustable N.A. stop
Sensor Options Through-the-lens (TTL) laser Spectra Probe white light range sensor Off-axis triangulation laser
Measurement Modes High Speed Move and Measure (MAM) Continuous Image Capture (CIC)